Dry etching technology for semiconductors Autor Nojiri, Kazuo

Available for University of the Philippines System via SpringerLink. Click here to access
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Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source Autor Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 Autor Mailig, Rengie Mark D.

Parametric study of the reactive ion etching of silicon Autor Sotto, Romelyn H.

Principles of plasma discharges and materials processing Autor Lieberman, M. A.

Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

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Plasma deposition, treatment, and etching of polymers. Autor D'Agostino, Riccardo

Plasma etching an introduction

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Plasma etching an introduction. Autor Manos, Dennis M.

Applications of plasma processes to VLSI technology