Søgeresultater

Parametric study of the reactive ion etching of silicon af Sotto, Romelyn H.

Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source af Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 af Mailig, Rengie Mark D.

Introduction to microlithography theory, materials, and processing

Available for University of the Philippines Diliman via ACS Publications. Click here to access
Also available remotely for University of the Philippines Diliman via ACS Publications. Click here to access thru EZproxy

Principles of plasma discharges and materials processing af Lieberman, M. A. ( Michael A.)

Dry etching technology for semiconductors af Nojiri, Kazuo

Available for University of the Philippines System via SpringerLink. Click here to access
Also available remotely for University of the Philippines System via SpringerLink. Click here to access thru EZproxy

Applications of plasma processes to VLSI technology

Plasma etching an introduction

Available for University of the Philippines System via ScienceDirect. Click here to access
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Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy

Dry etching for microelectronics

Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy