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Parametric study of the reactive ion etching of silicon за авторством Sotto, Romelyn H.

Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source за авторством Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 за авторством Mailig, Rengie Mark D.

Introduction to microlithography theory, materials, and processing

Available for University of the Philippines Diliman via ACS Publications. Click here to access
Also available remotely for University of the Philippines Diliman via ACS Publications. Click here to access thru EZproxy

Principles of plasma discharges and materials processing за авторством Lieberman, M. A. ( Michael A.)

Dry etching technology for semiconductors за авторством Nojiri, Kazuo

Available for University of the Philippines System via SpringerLink. Click here to access
Also available remotely for University of the Philippines System via SpringerLink. Click here to access thru EZproxy

Applications of plasma processes to VLSI technology

Plasma etching an introduction

Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy

Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy

Dry etching for microelectronics

Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy