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Parametric study of the reactive ion etching of silicon 著者: Sotto, Romelyn H.

Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source 著者: Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 著者: Mailig, Rengie Mark D.

Introduction to microlithography theory, materials, and processing

Available for University of the Philippines Diliman via ACS Publications. Click here to access
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Principles of plasma discharges and materials processing 著者: Lieberman, M. A. ( Michael A.)

Dry etching technology for semiconductors 著者: Nojiri, Kazuo

Available for University of the Philippines System via SpringerLink. Click here to access
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Applications of plasma processes to VLSI technology

Plasma etching an introduction

Available for University of the Philippines System via ScienceDirect. Click here to access
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Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

Available for University of the Philippines System via ScienceDirect. Click here to access
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Dry etching for microelectronics

Available for University of the Philippines System via ScienceDirect. Click here to access
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