Design for manufacturability with advanced lithography - Yu, Bei; Pan, David Z.; SpringerLink (Online service). (Cham Springer International Publishin, 2016)
Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-.
Electronic reproduction.
Keywords: Integrated circuits -- Design and construction; Photoresists; Lithography; Electronic books