Photopolymers photoresist materials, processes, and applications - Nakamura, Kenichiro (Chemical engineer) (Boca Raton CRC Press, 2015)
1. Basic idea of photopolymerization -- 2. Chemically amplified resists -- 3. Process of chemically amplified resists -- 4. Nanoimprint -- 5. Industrial application of photopolymers.
Includes bibliographical references and index.
Keywords: Photopolymers; Photoresists; Photopolymerization; Photopolymers -- Industrial applications; Microelectronics -- Materials; Electronic books