RF characterization of square spiral inductors on a 0.25 um digital CMOS process

RF characterization of square spiral inductors on a 0.25 um digital CMOS process

The growth of wireless applications in the low GHz range has been a catalyst in numerous research activities to develop wireless applications in standard digital CMOS processes. The relatively lower costs in developing single chip solutions for wireless applications in CMOS technology is considered...

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Publié dans:Philippine Engineering Journal 26, 1(2 copies) (2005(Je)).
Auteur principal: Hizon, John Richard E.
Autres auteurs: Rosales, Marc D., Alarcon, Louis P., Sabido, Delfin Jay IX
Format: Article
Langue:English
Sujets:
Metal oxide semiconductors, Complementary (CMOS)
Halo substrate contact.
Accès en ligne:Also available online for University of the Philippines Diliman. Click here