RF characterization of square spiral inductors on a 0.25 um digital CMOS process

RF characterization of square spiral inductors on a 0.25 um digital CMOS process

The growth of wireless applications in the low GHz range has been a catalyst in numerous research activities to develop wireless applications in standard digital CMOS processes. The relatively lower costs in developing single chip solutions for wireless applications in CMOS technology is considered...

Szczegółowa specyfikacja

Opis bibliograficzny
Wydane w:Philippine Engineering Journal 26, 1(2 copies) (2005(Je)).
1. autor: Hizon, John Richard E.
Kolejni autorzy: Rosales, Marc D., Alarcon, Louis P., Sabido, Delfin Jay IX
Format: Artykuł
Język:English
Hasła przedmiotowe:
Metal oxide semiconductors, Complementary (CMOS)
Halo substrate contact.
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