RF characterization of square spiral inductors on a 0.25 um digital CMOS process

RF characterization of square spiral inductors on a 0.25 um digital CMOS process

The growth of wireless applications in the low GHz range has been a catalyst in numerous research activities to develop wireless applications in standard digital CMOS processes. The relatively lower costs in developing single chip solutions for wireless applications in CMOS technology is considered...

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Podrobná bibliografie
Vydáno v:Philippine Engineering Journal 26, 1(2 copies) (2005(Je)).
Hlavní autor: Hizon, John Richard E.
Další autoři: Rosales, Marc D., Alarcon, Louis P., Sabido, Delfin Jay IX
Médium: Článek
Jazyk:English
Témata:
Metal oxide semiconductors, Complementary (CMOS)
Halo substrate contact.
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