Formation of SiHx on Silicon (100) using low energy negative hydrogen ions from a magnetized sheet plasma source
Common to methods of preparation of hydrogenated silicon (a-Si:H) and polycrystalline silicon silicon films done in the plasma done in plaza Enhanced Chemical Vapor deposition (PECVD) and other deposition experiments is the lack of explanation to the mechanism of deposition. This inadequacy deters t...
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| Médium: | Diplomová práce |
| Jazyk: | English |
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2004.
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