Shrinking possibilities.

Lithography will need multiple strategies to keep up with the evolution of memory and logic.

Bibliographic Details

Published in:	IEEE spectrum 46, 4 (2009).
Main Author:	Arnold, B.
Format:	Article
Language:	English
Subjects:	EUV lithography. Extreme ultraviolet lithography. Lithography. Logic evolution. Memory evolution. Optical lithography. Semiconductor industry.