Cita APA (7th ed.)

Heitzinger, C. Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Transactions on computer-aided design of integrated circuits and systems.

Cita Chicago (17th ed.)

Heitzinger, C. "Simulation of Arsenic in Situ Doping with Polysilicon CVD and Its Application to High Aspect Ratio Trenches." IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems .

Cita MLA (9th ed.)

Heitzinger, C. "Simulation of Arsenic in Situ Doping with Polysilicon CVD and Its Application to High Aspect Ratio Trenches." IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems, .