Plasma deposition of amorphous silicon-based materials.

Plasma deposition of amorphous silicon-based materials.

Opis bibliograficzny
1. autor: Bruno, Giovanni
Format: Książka
Język:English
Wydane: Boston Academic Press 1995
Seria:Plasma--materials interactions
Hasła przedmiotowe:
Amorphous semiconductors > Design and construction.
Plasma-enhanced chemical vapor deposition.
Silicon alloys.