Chemical vapor deposition for microelectronics principles, technology, and applications

Chemical vapor deposition for microelectronics principles, technology, and applications

Detalhes bibliográficos
Autor principal: Sherman, Arthur
Formato: Livro
Idioma:English
Publicado em: Park Ridge, N.J. Noyes c1987.
Assuntos:
Vapor-plating.
Integrated circuits > Design and construction.