Chemical vapor deposition for microelectronics principles, technology, and applications

Chemical vapor deposition for microelectronics principles, technology, and applications

Sonraí bibleagrafaíochta
Príomhchruthaitheoir: Sherman, Arthur
Formáid: LEABHAR
Teanga:English
Foilsithe / Cruthaithe: Park Ridge, N.J. Noyes c1987.
Ábhair:
Vapor-plating.
Integrated circuits > Design and construction.