Saint, C., & Saint, J. (2002). IC mask design: Essential layout techniques. McGraw-Hill.
Cita Chicago Style (17a ed.)Saint, Christopher, y Judy Saint. IC Mask Design: Essential Layout Techniques. New York: McGraw-Hill, 2002.
Cita MLA (9a ed.)Saint, Christopher, y Judy Saint. IC Mask Design: Essential Layout Techniques. McGraw-Hill, 2002.
Precaución: Estas citas no son 100% exactas.