A novel atmospheric pressure AC plasma jet system for deposition of titanium and titanium dioxide on silicon wafers

A novel atmospheric pressure AC plasma jet system for deposition of titanium and titanium dioxide on silicon wafers

Sonraí bibleagrafaíochta
Príomhchruthaitheoir: Delos Santos, Mercy Ann C. (Údar)
Formáid: Tráchtas
Teanga:English
Foilsithe / Cruthaithe: 2015.
Ábhair:
Plasma jets.
Titanium.
Titanium dioxide.
Silicon.
Rochtain ar líne:https://drive.google.com/file/d/0B4z4dtp29sZ7VVdRQ1FGSHZ1VG8/view?usp=sharing