A novel atmospheric pressure AC plasma jet system for deposition of titanium and titanium dioxide on silicon wafers

A novel atmospheric pressure AC plasma jet system for deposition of titanium and titanium dioxide on silicon wafers

Détails bibliographiques
Auteur principal: Delos Santos, Mercy Ann C. (Auteur)
Format: Thèse
Langue:English
Publié: 2015.
Sujets:
Plasma jets.
Titanium.
Titanium dioxide.
Silicon.
Accès en ligne:https://drive.google.com/file/d/0B4z4dtp29sZ7VVdRQ1FGSHZ1VG8/view?usp=sharing