00000ntm a2200000 i 4500 UP-100181420919506798 Buklod 20230519084131.0 m |o d | ta 230519s2021 ph r |||| u|eng|d UP-100181420919505434 DENGII rda eng LG 995 2021 M37 T47 Tercero, Jomar U. author. Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study thesis by Jomar U. Tercero; Magdaleno R. Vasquez, Jr., adviser; Satoshi Hamaguchi, co-adviser. Quezon City College of Engineering, University of the Philippines Diliman 2021. xv, 68 leaves illustrations 28 cm text rdacontent unmediated rdamedia volume rdacarrier Thesis (Master of Science in Materials Science and Engineering)--University of the Philippines, Diliman July 2021. F - no patentable invention or creation, not for personal publication and no confidential information. Yes - available to the general public. Molecular dynamics simulations. Silicon nitride. Vasquez, Magdaleno R. Jr. adviser. Hamaguchi, Satoshi co-adviser. FI UP UPD DENG-II LG 995 2021 M37 T47 Abstract https://drive.google.com/file/d/180-1aOW13oE1U9q16CJX4AzQnwZjhKK-/view application/pdf 75.19 Kb Open Access 0 Thesis