Mostrar 1 - 1 resultats de 1 per cerca 'Hamaguchi, Satoshi', hora de la petició: 0.01sec Refinar resultats
  1. 1

    Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study per Tercero, Jomar U.

    Publicat 2021
    Abstract
    Thesis

    Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Eines de cerca: