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    Research on chemical mechanical polishing mechanism of novel diffusion barrier Ru for Cu interconnect Tekijä Cheng, Jie

    Julkaistu 2018
    Available for University of the Philippines System via SpringerLink. Click here to access
    Also available remotely for University of the Philippines System via SpringerLink. Click here to access thru EZproxy
    Electronic Resource

    Research on chemical mechanical polishing mechanism of novel diffusion barrier Ru for Cu interconnect

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